Category: press

AIXTRON SE, the leading provider of MOCVD reactor equipment to the global optoelectronics, LED and semiconductor industries, has chosen CS CLEAN SYSTEMS dry bed scrubbers for its new R&D centres. The CLEANSORB waste gas treatment systems will be used for AIXTRON’s own R&D work on MOCVD equipment and processes.

In total, 11 CLEANSORB CS200SC models are to be installed at the AIXTRON R&D Center in Dornkaul, Aachen, Germany, as well as at the new training facility in Suzhou Industrial Park (SIP) in China. The Suzhou training centre is a joint venture between AIXTRON and the prestigious Suzhou Institute of Nanotech and Nanobionics (SINANO). When up-and-running, the CLEANSORB dry bed absorbers will be serviced directly from the CS CLEAN SYSTEMS China office based in Shanghai.

The gases and liquid organometallic precursors used in the MOVPE growth and etching of III-V epitaxial structures are critical in terms their toxic, pyrophoric, and corrosive natures. CLEANSORB dry chemisorber technology does not use activated carbon or other combustible materials. Hazardous gases are converted to stable solid by-products by dry chemical reaction at room temperature without the requirement for heating or the generation of contaminated waste water.

The hermetically sealed CLEANSORB absorber column design ensures that the MOCVD user never comes into contact with toxic MOCVD by-products. At the end of their absorbing lifetimes, CLEANSORB columns are returned to the local CS CLEAN SYSTEMS service partner for service. After refurbishment and refilling with fresh chemisorber, the absorber column is then shipped back to the customer for further usage.

CS CLEAN SYSTEMS AG has been a reliable partner to the semiconductor industry in Taiwan since 1996. With a local installation base of more than 700 systems, the unmatched CLEANSORB dry bed Absorbers are well accepted by the major IC manufactures in Taiwan.

TSMC recently placed repeated orders for the ongoing expansions of the two advanced 12-inch wafer GIGAFAB™ facilities (fab 12 and 14. As the largest foundry in the world, TSMC has long appreciated the reliable performance and safe operation of CLEANSORB dry bed absorbers.
CS CLEAN SYSTEMS AG continues its successful partnership with Zillion Tek Co., Ltd. as the sales and service representative within the Taiwanese market.

CS CLEAN SYSTEMS AG – as the global leader in dry bed absorber technology – has successfully developed a customized gas abatement solution for on-site fluorine generators.

The Semiconductor, TFT-LCD, and Photovoltaic industries have been rapidly increasing their global consumption of PFC (perfluorocarbon) gases as a source of fluorine radicals for process chamber cleaning. Unlike PFCs, elemental fluorine (F2) has no global warming potential and generates fundamentally lower manufacturing costs than gases derived from fluorine.

On-site fluorine generators are becoming quite popular, due to the significant volumes of gases and chemicals required for solar cell manufacturing. For instance, in thin-film processes gas can account for 15-20% of the cost of solar cell production.

Low-pressure on-site fluorine generation and delivery provide an environmentally friendly and cost-effective alternative for the safe and reliable supply of fluorine to both thermally activated and plasma-enhanced CVD process chamber cleaning.

CS CLEAN SYSTEMS’ customized gas abatement solution is based on the widely used CLEAN-PROTECT platform.

The CLEAN-PROTECT CP1000SCF is designed to handle all gas vent lines, and additionally works as an emergency absorber, fulfilling the high safety and environmental standards. The system is suitable for high total flow rates up to 3600 m3/h and offers an excellent absorption capacity of 345000 STP liter HF or 172500 STP liter F2.

A series of seminars recently held in Taiwan addressed the environmentally relevant issues of exhaust gas abatement for the semiconductor, photovoltaic and LED industries. The events focussed specifically on the emission of toxic arsenic compounds and global warming PFC gases. The meetings were hosted at the Ambassador Hotel in Hsinchu and Southern Taiwan Science Park Administration Bureau in Tainan.

The conference was organized by Zillion-Tek Co. Ltd, a leading supplier of semiconductor materials, chemical products and detection equipment, together with The Department of Safety, Health and Environmental Engineering of the National Kaohsiung First University of Science and Technology (NKFUS), and CS CLEAN SYSTEMS. CS CLEAN SYSTEMS AG is headquartered in Germany and specializes in the abatement of hazardous waste gases used in the semiconductor, LED and photovoltaic industries.

With a growing awareness of public health issues in recent years, and increasing environmental consciousness, both the discharge of toxic metals and gases with a high CO2 equivalent have been receiving closer attention. The seminar focussed on the risks posed to the workplace by the extremely toxic gas arsine, upon which the manufacture of both HB-LEDs and III-V semiconductors rely very heavily.

A number of presentations relating to the above topics were given by Professor BingQi Xu and Professor Zhengren Chen, both from NKFUS, Dr. Christoph Scholz, Chairman of the Supervisory Board and founder of CS CLEAN SYSTEMS, and Dr. Eckard Kopatzki, CTO of CS CLEAN SYSTEMS.

In addition to strategies for the energy-efficient scrubbing of greenhouse PFC gases, the use of dry bed scrubbing was discussed as a means of eliminating hazardous emissions of arsenic within the workplace and as waste water discharges in Taiwan.

CS CLEAN SYSTEMS uses its proprietary CLEANSORB granulates for the safe removal of toxic, pyrophoric and corrosive gases from semiconductor and related high tech manufacturing industries. Gases are chemically bound to form stable solid materials which are returned to CS CLEAN SYSTEMS dedicated service centers to ensure no emissions to air or to rivers.

In 2002 CS CLEAN SYSTEMS AG established a Sales Representative Office in Shanghai. Commencing from August 2010 CS CLEAN SYSTEMS AG signed a distribution agreement for P.R. China with its Taiwanese distribution partner Zillion Tek Co., Ltd. Together with the CS Shanghai Office we are confident to enlarge our market access and strengthen the leading market position in dry bed absorption of CS CLEAN SYSTEMS AG.

Contact details for P.R. China are as follows:
CS CLEAN SYSTEMS AG Shanghai Office
Room 1925, No. 99, Hui Chuan Road
Modern Universe Business Plaza
Shanghai 200050
VR China

Tel: +86 (21) 6605 1701
Fax: +86 (21) 6605 1710
www.csclean.com.cn

Shanghai Zillion Tek Electronic Technology Co., Ltd
Room 1702, West Building, Petrochemical Building
No. 1525, Pudong Avenue
Shanghai 200135
VR China

Tel : +86 (21) 58216075
Fax: +86 (21) 58216075 888
www.zillion-tek.com.tw

Personalities:
During Semicon Taiwan in September 2010 CS CLEAN SYSTEMS AG introduced Mr. Rongrong Luo, who joined the company’s headquarters in Ismaning in August 2010, as new Business Division Manager for the P.R. China. Mr. Luo studied in China and Germany and has several years of experience in sales of technical products.

Ismaning, June 2010

Learn more about the Safe Abatement of On-Site Fluorine Generators at the IHTESH 2010

On-site Fluorine Generation is rapidly gaining popularity among semiconductor and solar panel manufacturers as an eco-friendly alternative to the use of global warming PFC gases. Despite the many processing advantages, safety remains of critical importance, given the toxic and highly corrosive nature of the gases F2 and HF.

Purpose-designed CLEANSORB scrubber installations based on CS CLEAN SYSTEMS’ dry bed chemisorption technology are already successfully up-and-running at a number of semiconductor and photovoltaic manufacturing sites. The systems are designed to ensure the safe abatement of fluorine gases during venting, as well as a safeguard against unforeseen releases of the gases F2 and HF during abnormal operating conditions.

Sign up for the IHTESH 2010 conference, and listen to our presentation on June 23rd by Roland Poehlmann, who will be joined on the speakers’ podium by Bertrand Le Faou of Linde Electronic Gases.

CS CLEAN SYSTEMS is pleased to announce a new round of orders for its CLEANSORB dry bed abatement systems. The latest systems are scheduled for shipping to research institutes and manufacturing facilities which recently placed orders for new Oxford Plasma Technology equipment. In all, a total of six CLEANSORB dry bed absorbers are to be supplied, adding to the large existing base of CLEANSORB systems installed on Oxford Plasma Technology RIE and PECVD tools.

• Safe removal of silane (SiH4) and ammonia (NH3) waste gases from a Plasmalab¬133 system used for deposition of Nitride and Oxide Photovoltaic Thin Films;
• Etching of III-V structures for Optoelectronic R&D, requiring waste gas treatment of gallium and indium chloride etch by-products, in addition to the toxics phosphine and arsine, from a Plasmalab¬80¬Plus;
• Two customers using Oxford Plasma Technology systems for Deep Silicon MEMS Etch, where the dry scrubbers will absorb the toxic and corrosive fluoride by-products;
• PECVD of silicon nitride (SiN) and silicon oxide (SiO) for Biosensors;
• SiO Via Hole Etching for Si integrated circuits using a Plasmalab¬800¬Plus system.

The new systems are to be commissioned at research institutes and small manufacturing facilities located in Poland, Italy and Germany. Applications covered by the lab-scale CLEANSORB systems will include: 

CLEANSORB dry bed absorber technology has established itself as the waste gas abatement solution of choice for RIE and PECVD users, particularly on account of its maintenance-free operation, with no handling of hazardous by-products for laboratory staff. The absorbing lifetime of the refillable column typically extends to well beyond a year in R&D and pilot-scale settings. The system does not require electricity, water or fuel to function, and is always on stand-by with no start-up or shut-down required.

CS CLEAN SYSTEMS AG has completed a distribution agreement with SIGM PLUS Co. giving SIGM PLUS the exclusive rights to sell and service CS CLEAN SYSTEMS’ abatement devices on semiconductor exhaust gas applications within the territory of Russia.

“We are glad to have found a partner with an excellent expertise and reputation in the field of semiconductor technology,”

Roland Pöhlmann (CS CLEAN SYSTEMS AG), Director Sales & Marketing

The appointment of SIGM PLUS as the Russian partner will further enlarge our market access and strengthen the leading market position in dry bed absorption of CS CLEAN SYSTEMS AG.

Beginning from July 1st, 2009 CS CLEAN SYSTEMS AG has appointed Aimil Ltd. as the sales and service representative within the territory of India.

Through the new appointment of Aimil Ltd., we shall further increase the level of our customer support.

Contact details are as follows:

www.aimil.com

AIMIL LTD
Naimex House, A-8, Mohan
Co-operative Industrial Estate
Mathura Road
New Delhi -110044
India
Tel: +91 11 30810200
Fax: +91 11 26950011

Many of the milestone advances in the development of high-efficiency III-V solar cells can be attributed to the pioneering work of the Fraunhofer Institute for Solar Energy (ISE) in Freiburg, Germany. A CLEANSORB model CS125SC dry scrubber, supplied by CS CLEAN SYSTEMS, has been in continuous use in the III-V Epitaxy laboratory since 1997 to abate the exhaust gases from an Aixtron 2600G3 Planetary MOVPE Reactor. The CS125SC system is configured to safely remove toxic arsine and phosphine gases, in addition to the pyrophoric liquid precursors used in the epitaxial growth of the multi junction crystal regimes under investigation. These include GaAs, AlGaAs, GaInP, AlGaInP, AlGaAsSb, GaNAsSb and GaInNAs.

With the fast-growing acceptance of concentrator photovoltaic solar cells for terrestrial markets, further research effort is now required to improve the economics of production. Up until now, this has been hampered by the prohibitive cost of the III-V and germanium wafers required as substrates. It is against this background that the Fraunhofer Institute has recently been awarded BMBF funding (03SF0329A) for a 300 mm Aixtron tool. The Close Coupled Showerhead reactor will be used to grow epitaxial germanium and III-V structures on commercially-viable silicon wafers. CS CLEAN SYSTEMS is pleased to announce that ISE recently placed an order for a second CLEANSORB CS125SC MOCVD dry scrubber for the new project.

Proprietary CLEANSORB materials are specially developed by CS CLEAN SYSTEMS for dry, room-temperature conversion of SiH4, GeH4, AsH3, PH3, among many other hydrides, to solid by-products. As the technology leader in dry chemisorption scrubbing for both the Silicon and Compound Semiconductor industries, CS CLEAN SYSTEMS is ideally positioned to serve the growing field of III-V-Si applications. In addition to this latest order, first CLEANSORB systems have also been installed for the waste gas treatment of Photonics-on-Silicon and other research activity aimed at exploiting the benefits of III-V materials on silicon circuits.