GAS RETENTION PERFORMANCE* OF CLEANSORB DRY BED ABSORBERS

Gas or Liquid Precursor Species Chemical Formula Outlet Concentration
Ammonia NH3 20 ppm
Arsine AsH3 0.05 ppm
Bis(cyclopentadienyl)magnesium Mg(C5H5)2 3 mg/m3 (MgO)
Bis(tert-butylamino)silane SiH2(NHC4H9)2 5 ppm (SiH4)
Boron tribromide BBr3 1 ppm
Boron trichloride BCl3 1 ppm
Boron trifluoride BF3 0.35 ppm
Bromine Br2 0.1 ppm
Carbon monoxide CO 30 ppm
Chlorine Cl2 0.5 ppm
Chlorine trifluoride ClF3 0.1 ppm
Chromium hexacarbonyl Cr(CO)6 2 mg/m3 (Cr)
Diborane B2H6 0.1 ppm
Dichlorosilane SiH2Cl2 2 ppm (HCl)
Diethyl telluride Te(C2H5)2 0.1 mg/m3 (Te)
Diethylamine C4H11N 5 ppm
Diethylzinc (DEZn) Zn(C2H5)2 2 mg/m3 (Zn)
Digermane Ge2H6 0.2 ppm (GeH4)
Dimethyl dimethoxy silane Si(CH3)2(OCH3)2 5 ppm (SiH4)
Dimethyl silane SiH2(CH3)2 5 ppm (SiH4)
Dimethyl telluride Te(CH3)2 0.1 mg/m3 (Te)
Dimethylamine C2H7N 2 ppm
Dimethylcadmium Cd(CH3)2 0.01 mg/m3 (Cd)
Dimethylhydrazine (UDMH) N2H2(CH3)2 0.01 ppm
Dimethylzinc Zn(CH3)2 2 mg/m3 (Zn)
Disilane Si2H6 5 ppm
Ethylmethylamine C3H9N 2 ppm (dimethylamine)
Fluorine F2 1 ppm
Fluorophosgene / Carbonyl fluoride COF2 1 ppm (HF)
Formaldehyde CH2O 0.3 ppm
Germane GeH4 0.2 ppm
Hydrazine N2H4 0.01 ppm
Hydrogen bromide HBr 1 ppm
Hydrogen chloride HCl 2 ppm
Hydrogen fluoride HF 1 ppm
Hydrogen selenide H2Se 0.015 ppm
Hydrogen sulfide H2S 5 ppm
Iodine I2 0.1 ppm
Methyltrichlorosilane CH3SiCl3 2 ppm (HCl)
Monomethyl silane SiH3CH3 5 ppm (SiH4)
Nitric oxide NO 25 ppm
Nitrogen dioxide N2O4 (NO2) 3 ppm
Pentakis(dimethylamino)tantalum (PDMATa) Ta(N(CH3)2)5 2 ppm (dimethylamine)
Phosgene COCl2 0.02 ppm
Phosphine PH3 0.1 ppm
Phosphorus pentachloride PCl5 1 mg/m3
Phosphorus tribromide PBr3 0.5 ppm
Phosphorus trichloride PCl3 0.5 ppm
Phosphorus Trifluoride PF3 3 ppm
Phosphorylchloride POCl3 0.2 ppm
Ruthenocene C10H10Ru 20 mg/m3 (Ru)
Silane SiH4 5 ppm
Stibine SbH3 0.1 ppm
Sulfur dioxide SO2 0.5 ppm
Tantalum ethoxide Ta(OC2H5)5 20 mg/m3 (Ta2O5)
Tantalum pentachloride TaCl5 2 ppm (HCl)
Tantalum pentafluoride TaF5 1 ppm (HF)
Tellurium hexafluoride TeF6 0.02 ppm
Tertiarybutylarsine (TBAs) AsH2(C4H9) 0.01 mg/m3 (As)
Tertiarybutylphosphine (TBP) PH2(C4H9) 0.1 ppm (PH3)
Tetrabromomethane CBr4 1 ppm (HBr)
Tetracarbonylnickel Ni(CO)4 0.2 mg/m3 (Ni)
Tetrachlorosilane SiCl4 2 ppm (HCl)
Tetraethyl orthosilicate Si(OC2H5)4 10 ppm
Tetrafluorosilane SiF4 1 ppm (HF)
Tetrakis(dimethylamino)hafnium (TDMAHf) Hf(N(CH3)2)4 2 ppm (dimethylamine)
Tetrakis(dimethylamino)titanium (TDMATi) Ti(N(CH3)2)4 2 ppm (dimethylamine)
Tetrakis(dimethylamino)zirconium (TDMAZr) Zr(N(CH3)2)4 2 ppm (dimethylamine)
Tetrakis(ethylmethylamino)hafnium (TEMAHf) Hf(NC2H5CH3)4 2 ppm (dimethylamine)
Tetrakis(ethylmethylamino)zirconium (TEMAZr) Zr(NC2H5CH3)4 2 ppm (dimethylamine)
Titanium tetrachloride TiCl4 2 ppm (HCl)
Titanium tetrafluoride TiF4 1 ppm (HF)
Trichlorosilane SiHCl3 2 ppm (HCl)
Triethylaluminum Al(C2H5)3 2 mg/m3 (Al)
Triethylborane B(C2H5)3 0.5 mg/m3 ( H3BO3)
Triethylgallium Ga(C2H5)3 3 mg/m3 (Ga2O3)
Triethylindium In(C2H5)3 0.1 mg/m3 (In)
Triethylphosphate PO(C2H5O)3 50 mg/m3
Trimethyl phosphite C3H9O3P 2 ppm
Trimethylaluminum (TMAl) Al(CH3)3 2 mg/m3 (Al)
Trimethylantimony Sb(CH3)3 0.5 mg/m3 (Sb)
Trimethylboron B(CH3)3 0.1 ppm
Trimethylgallium (TMGa) Ga(CH3)3 3 mg/m3 (Ga2O3)
Trimethylindium (TMIn) In(CH3)3 0.1 mg/m3 (In)
Trisilane Si3H8 5 ppm (SiH4)
Tungsten hexacarbonyl W(CO)6 5 mg/m3 (W)
Tungsten hexafluoride WF6 1 ppm (HF)
Xenon difluoride XeF2 1 ppm (F2)

* Systems specifications are based on review and approval of the individual process application