Table of applications for exhaust gas purification
Applications for the purification of harmful industrial waste gases are our core expertise. From plasma etching and photovoltaics to the supply of specially developed granulates, our solutions support all of our customers’ relevant production processes.
CS CLEAN SOLUTIONS thus makes a significant contribution to neutralising harmful gases from the working environment and the ecosystem. The table provides an overview of industrial production processes from the photovoltaic, chemical and semiconductor industries with the associated process gases.
| Process Application | Typical Gases or Liquid Precursors Used |
|---|---|
| Plasma Etch | |
| Metal Etch | Cl2, BCl3, HCl, CF4, SF6 |
| Poly Silicon Etch | Cl2, HBr, Br2, SF6, CF4, NF3, C4F8 |
| Nitride Etch, Oxide Etch | CF4, CHF3, C2F6, C3F8, C4F8, CH2F2, NF3, |
| SF6, O2 | |
| Tungsten Etchback | SF6 |
| Ion Implantation | |
| High, Medium, Low | AsH3, PH3, BF3, P, As, Sb, Sb(CH3)3, GeH4, GeF4 |
| ALD, LPCVD, PECVD, HDP-CVD | |
| TEOS, undoped | TEOS, O2, O3 |
| BPSG | TEOS, O3, TMP, TMB, SiH4, PH3, B2H6 |
| Poly-Si (doped) | SiH4, (AsH3, PH3) |
| Silicon Germanium | SiH4, GeH4 |
| Oxide | SiH4, O2 |
| Nitride, doped | SiH4, NH3, (TMP, TMB, SiH4, PH3, B2H6) |
| Oxynitride, doped | SiH4, NH3, N2O, (TMP, TMB, SiH4, PH3, B2H6) |
| Low-k dielectrics | 1MS, 2MS, 3MS, 4MS, DMDMOS |
| High-k dielectrics | TMA, TEMAH, TDEAH, TAETO, PET |
| Gate Electrodes | MPA, Ru(Etcp)2, PEMAT |
| Copper CVD | Cu(hfac)(TMVS) |
| Tungsten (Silicide) | WF6, SiH4, H2, (DCS) |
| Barrier Layers | TiCl4, NH3, TDMAT, PDMATa, PDEATa, |
| TAETO, W(CO)6 | |
| Plasma Chamber Cleaning | |
| PFC plasma | C2F6, C4F8, NF3 |
| Remote NF3 plasma | F2 |
| Epitaxy | |
| Silicon (doped) | DCS, TCS, SiH4, (AsH3, PH3, B2H6) |
| Silicon-Germanium | SiH4, GeH4, CBr4, 1MS, 2MS, 3MS, HCl |
| Silicon-Carbide (SiC) | SiH4, CH4, C3H8, TMA, HCl |
| Compound Semiconductors, Optoelectronics, III-V on Si | |
| GaAs, InP MOVPE (MOCVD) | TMGa, AsH3, TBA, TMIn, PH3, TBP |
| GaN MOVPE (MOCVD) | TMGa, NH3, UDMH |
| MBE (MOMBE) | As, P, AsH3, PH3 |
| III-V Etch | Cl2, BCl3, HBr, SiF4, SF6, CH4, GaCl3, InCl3, AsH3, O2 |
| Photovoltaics | |
| Concentrator Photovoltaics | PH3, AsH3, metalorganics, SiH4, GeH4 |
| CIGS | H2S, H2Se |
| Gas Supply | |
| Emergency Gas Release Absorbers | Toxics, Pyrophorics, Corrosives |
| Gas Cabinet Purging | |
