Author: CS Clean Solutions GmbH

Beginning from January 1st, 2014 CS CLEAN SYSTEMS AG has appointed AB Mandal Pty. Ltd.
as sales and service representative for the territory of Australia.

With more than 20 years of experience in the fit-out of high-tech research laboratories AB Mandal provides the full range of equipment for clean room fabrication, including conceptual design, installation and hook-up of piping and electrical services to the tool. Our customers in Australia will profit from their expertise in vacuum, exhaust and abatement systems and can, from now on, rely on an experienced local partner for servicing and refill of their dry bed exhaust gas abatement solutions.

The appointment of AB Mandal as our Australian partner will further enlarge our market access and strengthen CLEANSORB^® as the leading technology in dry bed absorption of exhaust gases for the semiconductor and related high-tech industries.

Contact details are as follows:
AB Mandal Pty. Ltd.
115 Blues Point Road
McMahons Point, 2060 NSW – Australia

Phone: +61 (2) 9954 4330
e-mail:
www.abmandal.com.au

CS CLEAN SYSYEMS, Inc. is a member of the F450C and associate of the G450C consortiums located at CNSE Albany, New York.

The Global 450 Consortium (G450C) was established to develop and demonstrate the technologies required to enable semiconductor manufacturing on large-diameter 450mm wafers. The initiative, which is supported by major semiconductor manufacturers and receives further funding from the state of New York, operates from a dedicated cleanroom facility at CNSE’s NanoTech Complex in Albany, NY.

CS CLEAN SYSTEMS held an informative two-hour Gas Abatement Workshop on Tuesday, October 22, 2013, at the CNSE campus. Over forty (40) attendees from the G450C and F450C consortia, as well as fellow semiconductor associates from IBM, Samsung, TSMC, Global Foundries, and Intel were in attendance.

The workshop addressed gas abatement applications within the context of next-generation chip fabrication and focused on key future requirements in the areas of safety, energy-conservation and minimizing environmental impact. Several process applications which are predicted to play an increasingly important role as device dimensions are scaled downwards towards 10nm were also discussed, including: Plasma Etch, Atomic Layer Deposition, III-V on Silicon MOCVD. The guest speaker was Mr. Joe Guerin, Head of Sales and Marketing, CS CLEAN SYSTEMS, AG.

CS CLEAN SYSTEMS AG proudly announces that Corial, a process company that designs and manufactures plasma etching and deposition systems, has chosen our CS200 BASELINE systems for their new clean room facilities.

Dedicated to innovative solutions for development and manufacture of LED, OLED, MEMS and semiconductor compounds Corial will benefit from the user-friendly features of our BASELINE system, like eco-friendly removal of hazardous gases at room temperature, built-in endpoint detection for column capacity and low cost of ownership.

As a leading edge solutions provider for the abatement of semiconductor exhaust gases, CS CLEAN SYSTEMS is proud to participate in the Facilities 450 mm Consortium. It will add its expertise in the reduction of installation costs and media consumption, energy-saving, workplace safety and environmental-friendly manufacturing.

Joe Guerin, Head of Sales & Marketing of CS CLEAN SYSTEMS commented:

Wafer production at the 450mm wafer scale will be even less tolerant of tool downtime than at present, and manufacturers will be seeking new ways to reduce installation costs and conserve facility resources. CS CLEAN SYSTEMS unique dry bed chemisorption technology offers key advantages in each of these areas. We are grateful for this opportunity to work closely with leading industry partners right from the early stages of this exciting new technology.

Joe Guerin, Head of Sales & Marketing

The consortium will use the capabilities established at CNSE for joint development activities and support of a comprehensive industry ecosystem. For more information, visit www.g450c.org

About F450C:

The Facilities 450mm Consortium (F450C) is a first-of-its-kind partnership at SUNY’s College of Nanoscale Science and Engineering (CNSE) that is leading the global effort to design and build next-generation 450mm computer chip fabrication facilities. The collaboration includes 10 of the world’s leading nanoelectronics facility companies, including Air Liquide, CH2M HILL, CS Clean Systems, Ceres Technologies, Edwards, Haws Corporation, Mega Fluid Systems, M+W Group, Ovivo, and Swagelok. Members of F450C are working closely with the Global 450mm Consortium (G450C), as announced by New York Governor Andrew M. Cuomo, to identify viable solutions required for 450mm high-volume facility construction, with initial focus areas to include reducing tool installation cost and duration, and improving facility sustainability.

This year’s Service Training for our partners Aimil Ltd. in India and Sigm Plus Co. in Russia was held at CS CLEAN SYSTEMS AG from May 21 to May 23.

During the training all aspects of semiconductor process technology, CS equipment features and safety issues were covered. With growing activities and many opportunities in the Indian and Russian markets our local service personnel is well-equipped for efficient trouble shooting and user support.

CS CLEAN SYSTEMS AG have confirmed they will be Gold sponsors at the Compound Semiconductor industry’s premier international event, CS International, which will be held in Frankfurt, Germany on 4th & 5th March 2013.

As a truly global company with research and development, manufacturing and marketing located in dedicated centers of competence throughout Europe, Japan, USA, and the Far East, CS CLEAN SYSTEMS AG have been a reliable partner for exhaust gas abatement. With their primary focus on dry bed absorption and more than 25 years of experience serving the semiconductor industry, more than 3,000 installations worldwide testify to customer confidence in the company’s unique products and services.

CS CLEAN SYSTEMS continue to extend their competence and have already established themselves in future technologies such as III-V Photovoltaics, III-V on Si and Atomic Layer Deposition (ALD). The key elements which guarantee safety, reliability and ease of handling have been purpose-designed to meet the demands of tomorrow’s advanced materials.

The must attend event for 2013 is the third CS International conference in Frankfurt, Germany, where delegates will gain a comprehensive overview of the entire compound semiconductor industry.

Professionals from around the world will attend this two-day event to hear key insights and opportunities, from a range of leading analysts, and learn of the latest chip developments in LEDs, solar cells, lasers and power and RF electronics.

Delegates will get the opportunity to network with leading industry professionals of the III-V chip making industry and interact with suppliers.

Industry leaders from Intel, Cree, Epistar, RFMD, TriQuint and over 25 other leading chipmakers will also be present and share their perspective on the latest developments in device technology.

United Microelectronics Corporation (UMC), a leading global semiconductor foundry, held its groundbreaking ceremony for a new 300mm fab complex at Tainan, Taiwan, in late May 2012. Again, CS CLEAN SYSTEMS AG was chosen as a reliable partner for exhaust gas abatement for this new generation of 300mm manufacturing. Equipment move-in for the state-of-the-art P5 and P6 fabs is scheduled for the second half of 2013 , thus strengthening UMC’s position as a competitive provider of advanced technology for the semiconductor industry.

CS CLEAN SYSTEMS AG is proud to be among UMC’s trusted partners for exhaust gas abatement and to continue its fruitful business relation with UMC.

We are happy to announce that CS CLEAN SYSTEMS AG has successfully placed one of its PRIMELINE MOCVD abatement systems in the Chinese market. China Electronics Technology Group with its Nanjing Electronic Devices Institute has chosen our CS200PS for its MOCVD-exhaust gas abatement. CETC was convinced by the unmatched safety and manufacturing reliability of our PRIMELINE system, like passive operation mode, 100% process availability and MOCVD-specific safety features. Being one of the leading governmental research facilities in China, we are glad to count this institution among our customers and trust in a fruitful working relationship.

From May 21 to 25, 2012 a sales and service training for our East Asian partners, Zillionhttps://www.csclean.com/en/applications/compound-semiconductors-mocvd/ Tek Shanghai and Zillion Tek Taiwan, was held at CS CLEAN SYSTEMS AG. With our first PRIMELINE MOCVD-systems successfully placed in the East Asian market and our market share in this region continually growing, this training reflects the importance of first-class customer service and expertise our customers may expect from CS CLEAN SYSTEMS. During the training all aspects of semiconductor process technology, CS equipment features and safety issues were covered. Ample time was reserved for hands-on practical training so our service staff is well-equipped for efficient trouble shooting and user support.

AIXTRON SE, the leading provider of MOCVD reactor equipment to the global optoelectronics, LED and semiconductor industries, has chosen CS CLEAN SYSTEMS dry bed scrubbers for its new R&D centres. The CLEANSORB waste gas treatment systems will be used for AIXTRON’s own R&D work on MOCVD equipment and processes.

In total, 11 CLEANSORB CS200SC models are to be installed at the AIXTRON R&D Center in Dornkaul, Aachen, Germany, as well as at the new training facility in Suzhou Industrial Park (SIP) in China. The Suzhou training centre is a joint venture between AIXTRON and the prestigious Suzhou Institute of Nanotech and Nanobionics (SINANO). When up-and-running, the CLEANSORB dry bed absorbers will be serviced directly from the CS CLEAN SYSTEMS China office based in Shanghai.

The gases and liquid organometallic precursors used in the MOVPE growth and etching of III-V epitaxial structures are critical in terms their toxic, pyrophoric, and corrosive natures. CLEANSORB dry chemisorber technology does not use activated carbon or other combustible materials. Hazardous gases are converted to stable solid by-products by dry chemical reaction at room temperature without the requirement for heating or the generation of contaminated waste water.

The hermetically sealed CLEANSORB absorber column design ensures that the MOCVD user never comes into contact with toxic MOCVD by-products. At the end of their absorbing lifetimes, CLEANSORB columns are returned to the local CS CLEAN SYSTEMS service partner for service. After refurbishment and refilling with fresh chemisorber, the absorber column is then shipped back to the customer for further usage.