Konzentrationen am Auslass der CLEANSORB Trockenbettabsorber *
Gas oder Flüssiger Precursor | Summenformel | Auslasskonzentration |
---|---|---|
Ammoniak | NH3 | 20 ppm |
Arsin | AsH3 | 0.05 ppm |
Bis(tert-butylamino)silan | SiH2(NHC4H9)2 | 5 ppm (SiH4) |
Bortribromid | BBr3 | 1 ppm |
Bortrichlorid | BCl3 | 1 ppm |
Bortrifluorid | BF3 | 0.35 ppm |
Brom | Br2 | 0.1 ppm |
Bromwasserstoff | HBr | 1 ppm |
Chlor | Cl2 | 0.5 ppm |
Chlortrifluorid | ClF3 | 0.1 ppm |
Chlorwasserstoff | HCl | 2 ppm |
Chromhexacarbonyl | Cr(CO)6 | 2 mg/m3 (Cr) |
Di(cyclopentadienyl)magnesium | Mg(C5H5)2 | 3 mg/m3 (MgO) |
Diboran | B2H6 | 0.1 ppm |
Dichlorsilan | SiH2Cl2 | 2 ppm (HCl) |
Diethylamin | C4H11N | 5 ppm |
Diethyltellur | Te(C2H5)2 | 0.1 mg/m3 (Te) |
Diethylzink (DEZn) | Zn(C2H5)2 | 2 mg/m3 (Zn) |
Digerman | Ge2H6 | 0.2 ppm (GeH4) |
Dimethylamin | C2H7N | 2 ppm |
Dimethylcadmium | Cd(CH3)2 | 0.01 mg/m3 (Cd) |
Dimethyldimethoxysilan | Si(CH3)2(OCH3)2 | 5 ppm (SiH4) |
Dimethylhydrazin (UDMH) | N2H2(CH3)2 | 0.01 ppm |
Dimethylsilan | SiH2(CH3)2 | 5 ppm (SiH4) |
Dimethyltellur | Te(CH3)2 | 0.1 mg/m3 (Te) |
Dimethylzink | Zn(CH3)2 | 2 mg/m3 (Zn) |
Disilan | Si2H6 | 5 ppm |
Ethylmethylamin | C3H9N | 2 ppm (Dimethylamin) |
Fluor | F2 | 1 ppm |
Fluorophosgen / Carbonylfluorid | COF2 | 1 ppm (HF) |
Fluorwasserstoff | HF | 1 ppm |
Formaldehyd | CH2O | 0.3 ppm |
German | GeH4 | 0.2 ppm |
Hydrazin | N2H4 | 0.01 ppm |
Iod | I2 | 0.1 ppm |
Kohlenmonoxid | CO | 30 ppm |
Monomethylsilan | SiH3CH3 | 5 ppm (SiH4) |
Nickeltetracarbonyl | Ni(CO)4 | 0.2 mg/m3 (Ni) |
Pentakis(dimethylamino)tantal (PDMATa) | Ta(N(CH3)2)5 | 2 ppm (Dimethylamin) |
Phosgen | COCl2 | 0.02 ppm |
Phosphin | PH3 | 0.1 ppm |
Phosphorpentachlorid | PCl5 | 1 mg/m3 |
Phosphortribromid | PBr3 | 0.5 ppm |
Phosphortrichlorid | PCl3 | 0.5 ppm |
Phosphortrifluorid | PF3 | 3 ppm |
Phosphorylchlorid | POCl3 | 0.2 ppm |
Ruthenocen | C10H10Ru | 20 mg/m3 (Ru) |
Schwefeldioxid | SO2 | 0.5 ppm |
Schwefelwasserstoff | H2S | 5 ppm |
Selenwasserstoff | H2Se | 0.015 ppm |
Silan | SiH4 | 5 ppm |
Siliziumtetrachlorid | SiCl4 | 2 ppm (HCl) |
Siliziumtetrafluorid | SiF4 | 1 ppm (HF) |
Siliziumtrichlorid | SiHCl3 | 2 ppm (HCl) |
Stiban | SbH3 | 0.1 ppm |
Stickstoffdioxid | N2O4 (NO2) | 3 ppm |
Stickstoffmonoxid | NO | 25 ppm |
Tantal(V)-chlorid | TaCl5 | 2 ppm (HCl) |
Tantal(V)-fluorid | TaF5 | 1 ppm (HF) |
Tantal(V)-ethoxid | Ta(OC2H5)5 | 20 mg/m3 (Ta2O5) |
t-Butylarsen (TBAs) | AsH2(C4H9) | 0.01 mg/m3 (As) |
t-Butylphosphor (TBP) | PH2(C4H9) | 0.1 ppm (PH3) |
Tellurhexafluorid | TeF6 | 0.02 ppm |
Tetrabromomethan | CBr4 | 1 ppm (HBr) |
Tetraethylorthosilicat | Si(OC2H5)4 | 10 ppm |
Tetrakis(dimethylamino)hafnium (TDMAHf) | Hf(N(CH3)2)4 | 2 ppm (dimethylamine) |
Tetrakis(dimethylamino)titan (TDMATi) | Ti(N(CH3)2)4 | 2 ppm (dimethylamine) |
Tetrakis(dimethylamino)zirkon (TDMAZr) | Zr(N(CH3)2)4 | 2 ppm (dimethylamine) |
Tetrakis(ethylmethylamido)hafnium (TEMAHf) | Hf(NC2H5CH3)4 | 2 ppm (dimethylamine) |
Tetrakis(ethylmethylamido)zirkonium (TEMAZr) | Zr(NC2H5CH3)4 | 2 ppm (dimethylamine) |
Titantetrachlorid | TiCl4 | 2 ppm (HCl) |
Titantetrafluorid | TiF4 | 1 ppm (HF) |
Trichlormethylsilan / Methylsilylchlorid | CH3SiCl3 | 2 ppm (HCl) |
Triethylaluminum | Al(C2H5)3 | 2 mg/m3 (Al) |
Triethylboran | B(C2H5)3 | 0.5 mg/m3 ( H3BO3) |
Triethylgallium | Ga(C2H5)3 | 3 mg/m3 (Ga2O3) |
Triethylindium | In(C2H5)3 | 0.1 mg/m3 (In) |
Triethylphosphat | PO(C2H5O)3 | 50 mg/m3 |
Trimethylphosphit | C3H9O3P | 2 ppm |
Trimethylaluminum (TMAl) | Al(CH3)3 | 2 mg/m3 (Al) |
Trimethylantimon | Sb(CH3)3 | 0.5 mg/m3 (Sb) |
Trimethylbor | B(CH3)3 | 0.1 ppm |
Trimethylgallium (TMGa) | Ga(CH3)3 | 3 mg/m3 (Ga2O3) |
Trimethylindium (TMIn) | In(CH3)3 | 0.1 mg/m3 (In) |
Trisilan | Si3H8 | 5 ppm (SiH4) |
Wolframhexacarbonyl | W(CO)6 | 5 mg/m3 (W) |
Wolframhexafluorid | WF6 | 1 ppm (HF) |
Xenondifluorid | XeF2 | 1 ppm (F2) |
* Die Konfiguration des Absorbers richtet sich nach der jeweiligen Prozessapplikation