Konzentrationen am Auslass der CLEANSORB Trockenbettabsorber *

Gas oder Flüssiger Precursor Summenformel Auslasskonzentration
Ammoniak NH3 20 ppm
Arsin AsH3 0.05 ppm
Bis(tert-butylamino)silan SiH2(NHC4H9)2 5 ppm (SiH4)
Bortribromid BBr3 1 ppm
Bortrichlorid BCl3 1 ppm
Bortrifluorid BF3 0.35 ppm
Brom Br2 0.1 ppm
Bromwasserstoff HBr 1 ppm
Chlor Cl2 0.5 ppm
Chlortrifluorid ClF3 0.1 ppm
Chlorwasserstoff HCl 2 ppm
Chromhexacarbonyl Cr(CO)6 2 mg/m3 (Cr)
Di(cyclopentadienyl)magnesium Mg(C5H5)2 3 mg/m3 (MgO)
Diboran B2H6 0.1 ppm
Dichlorsilan SiH2Cl2 2 ppm (HCl)
Diethylamin C4H11N 5 ppm
Diethyltellur Te(C2H5)2 0.1 mg/m3 (Te)
Diethylzink (DEZn) Zn(C2H5)2 2 mg/m3 (Zn)
Digerman Ge2H6 0.2 ppm (GeH4)
Dimethylamin C2H7N 2 ppm
Dimethylcadmium Cd(CH3)2 0.01 mg/m3 (Cd)
Dimethyldimethoxysilan Si(CH3)2(OCH3)2 5 ppm (SiH4)
Dimethylhydrazin (UDMH) N2H2(CH3)2 0.01 ppm
Dimethylsilan SiH2(CH3)2 5 ppm (SiH4)
Dimethyltellur Te(CH3)2 0.1 mg/m3 (Te)
Dimethylzink Zn(CH3)2 2 mg/m3 (Zn)
Disilan Si2H6 5 ppm
Ethylmethylamin C3H9N 2 ppm (Dimethylamin)
Fluor F2 1 ppm
Fluorophosgen / Carbonylfluorid COF2 1 ppm (HF)
Fluorwasserstoff HF 1 ppm
Formaldehyd CH2O 0.3 ppm
German GeH4 0.2 ppm
Hydrazin N2H4 0.01 ppm
Iod I2 0.1 ppm
Kohlenmonoxid CO 30 ppm
Monomethylsilan SiH3CH3 5 ppm (SiH4)
Nickeltetracarbonyl Ni(CO)4 0.2 mg/m3 (Ni)
Pentakis(dimethylamino)tantal (PDMATa) Ta(N(CH3)2)5 2 ppm (Dimethylamin)
Phosgen COCl2 0.02 ppm
Phosphin PH3 0.1 ppm
Phosphorpentachlorid PCl5 1 mg/m3
Phosphortribromid PBr3 0.5 ppm
Phosphortrichlorid PCl3 0.5 ppm
Phosphortrifluorid PF3 3 ppm
Phosphorylchlorid POCl3 0.2 ppm
Ruthenocen C10H10Ru 20 mg/m3 (Ru)
Schwefeldioxid SO2 0.5 ppm
Schwefelwasserstoff H2S 5 ppm
Selenwasserstoff H2Se 0.015 ppm
Silan SiH4 5 ppm
Siliziumtetrachlorid SiCl4 2 ppm (HCl)
Siliziumtetrafluorid SiF4 1 ppm (HF)
Siliziumtrichlorid SiHCl3 2 ppm (HCl)
Stiban SbH3 0.1 ppm
Stickstoffdioxid N2O4 (NO2) 3 ppm
Stickstoffmonoxid NO 25 ppm
Tantal(V)-chlorid TaCl5 2 ppm (HCl)
Tantal(V)-fluorid TaF5 1 ppm (HF)
Tantal(V)-ethoxid Ta(OC2H5)5 20 mg/m3 (Ta2O5)
t-Butylarsen (TBAs) AsH2(C4H9) 0.01 mg/m3 (As)
t-Butylphosphor (TBP) PH2(C4H9) 0.1 ppm (PH3)
Tellurhexafluorid TeF6 0.02 ppm
Tetrabromomethan CBr4 1 ppm (HBr)
Tetraethylorthosilicat Si(OC2H5)4 10 ppm
Tetrakis(dimethylamino)hafnium (TDMAHf) Hf(N(CH3)2)4 2 ppm (dimethylamine)
Tetrakis(dimethylamino)titan (TDMATi) Ti(N(CH3)2)4 2 ppm (dimethylamine)
Tetrakis(dimethylamino)zirkon (TDMAZr) Zr(N(CH3)2)4 2 ppm (dimethylamine)
Tetrakis(ethylmethylamido)hafnium (TEMAHf) Hf(NC2H5CH3)4 2 ppm (dimethylamine)
Tetrakis(ethylmethylamido)zirkonium (TEMAZr) Zr(NC2H5CH3)4 2 ppm (dimethylamine)
Titantetrachlorid TiCl4 2 ppm (HCl)
Titantetrafluorid TiF4 1 ppm (HF)
Trichlormethylsilan / Methylsilylchlorid CH3SiCl3 2 ppm (HCl)
Triethylaluminum Al(C2H5)3 2 mg/m3 (Al)
Triethylboran B(C2H5)3 0.5 mg/m3 ( H3BO3)
Triethylgallium Ga(C2H5)3 3 mg/m3 (Ga2O3)
Triethylindium In(C2H5)3 0.1 mg/m3 (In)
Triethylphosphat PO(C2H5O)3 50 mg/m3
Trimethylphosphit C3H9O3P 2 ppm
Trimethylaluminum (TMAl) Al(CH3)3 2 mg/m3 (Al)
Trimethylantimon Sb(CH3)3 0.5 mg/m3 (Sb)
Trimethylbor B(CH3)3 0.1 ppm
Trimethylgallium (TMGa) Ga(CH3)3 3 mg/m3 (Ga2O3)
Trimethylindium (TMIn) In(CH3)3 0.1 mg/m3 (In)
Trisilan Si3H8 5 ppm (SiH4)
Wolframhexacarbonyl W(CO)6 5 mg/m3 (W)
Wolframhexafluorid WF6 1 ppm (HF)
Xenondifluorid XeF2 1 ppm (F2)

* Die Konfiguration des Absorbers richtet sich nach der jeweiligen Prozessapplikation